Thin film deposition at atmospheric pressure using dielectric barrier discharges: Advances on three-dimensional porous substrates and functional coatings

Fanelli, Fiorenza and Bosso, Piera and Mastrangelo, Anna Maria and Fracassi, Francesco (2016) Thin film deposition at atmospheric pressure using dielectric barrier discharges: Advances on three-dimensional porous substrates and functional coatings. Japanese Journal of Applied Physics, 55 (7S2). 07LA01. ISSN 0021-4922

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Official URL: http://dx.doi.org/10.7567/JJAP.55.07LA01
Item Type: Article
Subjects: 500 Scienze naturali e Matematica > 500.2 Scienze fisiche
500 Scienze naturali e Matematica > 540 Chimica e scienze connesse
Depositing User: Fiorenza Fanelli
Date Deposited: 02 Feb 2024 12:29
Last Modified: 02 Feb 2024 12:29
URI: http://eprints.bice.rm.cnr.it/id/eprint/22619

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