Fanelli, Fiorenza and Fracassi, Francesco (2016) Thin Film Deposition on Open‐Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges. Plasma Processes and Polymers, 13 (4). pp. 470-479. ISSN 1612-8850
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Fanelli _foams 2016 POSTPRINT.pdf - Accepted Version Available under License Creative Commons Attribution Non-commercial No Derivatives. Download (2MB) | Preview |
Abstract
Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its threedimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Dielectric barrier discharges (DBD); fluoropolymers; plasma-enhanced chemical vapor deposition (PECVD); polyurethane foam |
| Subjects: | 500 Scienze naturali e Matematica > 500.2 Scienze fisiche 500 Scienze naturali e Matematica > 540 Chimica e scienze connesse |
| Depositing User: | Fiorenza Fanelli |
| Date Deposited: | 02 Feb 2024 12:17 |
| Last Modified: | 02 Feb 2024 12:17 |
| URI: | http://eprints.bice.rm.cnr.it/id/eprint/22620 |
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