Effect of Gas Impurities on the Operation of Dielectric Barrier Discharges Fed with He, Ar, and Ar‐C3F6

Fanelli, Fiorenza and d'Agostino, Riccardo and Fracassi, Francesco (2011) Effect of Gas Impurities on the Operation of Dielectric Barrier Discharges Fed with He, Ar, and Ar‐C3F6. Plasma Processes and Polymers, 8 (6). pp. 557-567. ISSN 1612-8850

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Official URL: http://dx.doi.org/10.1002/ppap.201000179


The influence of N2, O2, air, and water vapor feed gas impurities on the operation of an atmospheric pressure parallel plate DBD fed with helium and argon was investigated. The addition of increasing amounts of these impurities, under fixed excitation frequency and applied voltage, is responsible above certain thresholds of two distinct phenomena, namely the transition from a homogeneous to a filamentary appearance of the discharge and the contraction of the discharge volume. Among the different contaminants N2 shows the highest threshold limit values, O2 and H2O the lowest ones, while air generally exhibits an intermediate behavior. The effect of feed gas impurities was also studied on the PE-CVD of fluoropolymers from Ar-C3F6 fed filamentary DBDs. Contaminants addition results in a decrease of the input power and of the deposition rate as well as in a change of the film morphology, however it does not influence significantly the chemical composition of the fluoropolymer film, the monomer depletion and the distribution of by-products in the exhaust gas.

Item Type: Article
Uncontrolled Keywords: Dielectric barrier discharges (DBD); fluoropolymers; gas impurities; plasma-enhanced chemical vapor deposition (PECVD)
Subjects: 500 Scienze naturali e Matematica > 500.2 Scienze fisiche
500 Scienze naturali e Matematica > 540 Chimica e scienze connesse
Depositing User: Fiorenza Fanelli
Date Deposited: 26 Jan 2024 14:48
Last Modified: 26 Jan 2024 14:48
URI: http://eprints.bice.rm.cnr.it/id/eprint/22642

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