Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC‐MS Investigation of By‐Products

Fanelli, Fiorenza and Lovascio, Sara and d'Agostino, Riccardo and Arefi‐Khonsari, Farzaneh and Fracassi, Francesco (2010) Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC‐MS Investigation of By‐Products. Plasma Processes and Polymers, 7 (7). pp. 535-543. ISSN 1612-8850

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The thin film deposition in DBDs fed with Ar/HMDSO/O2 mixtures was studied by comparing the FT-IR spectra of the deposits with the GC-MS analyses of the exhaust gas. Under the experimental conditions investigated, oxygen addition does not enhance the activation of the monomer while it highly influences the chemical composition and structure of the deposited coating as well as the quali-quantitative distribution of by-products in the exhaust. Without oxygen addition a coating with high monomer structure retention is obtained and the exhaust contains several by-products such as silanes, silanols, and linear and cyclic siloxanes. The dimethylsiloxane unit seems to be the most important building block of oligomers. Oxygen addition to the feed is responsible for an intense reduction of the organic character of the coating as well as for a steep decrease, below the quantification limit, of the concentration of all by-products except silanols. Some evidences induce to claim that the silanol groups contained in the deposits are formed through heterogeneous (plasma-surface) reactions.

Item Type: Article
Uncontrolled Keywords: Dielectric barrier discharges (DBDs); FT-IR; gas chromatography–mass spectrometry (GC-MS); hexamethyldisiloxane (HMDSO); plasma-enhanced chemical vapor deposition (PECVD)
Subjects: 500 Scienze naturali e Matematica > 500.2 Scienze fisiche
500 Scienze naturali e Matematica > 540 Chimica e scienze connesse
Depositing User: Fiorenza Fanelli
Date Deposited: 26 Jan 2024 14:53
Last Modified: 26 Jan 2024 14:53

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