Fanelli, Fiorenza and Di Renzo, Giovanni and Fracassi, Francesco and d'Agostino, Riccardo (2009) Recent Advances in the Atmospheric Pressure PE‐CVD of Fluorocarbon Films: Influence of Air and Water Vapour Impurities. Plasma Processes and Polymers, 6 (S1). ISSN 1612-8850
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Abstract
The influence of air and water vapour on the deposition process of fluoropolymers in argonhexafluoropropene (Ar-C3F6) filamentary dielectric barrier discharges was investigated by adding known concentrations of these contaminants to the feed gas. The obtained results show that Ar-C3F6 DBDs allow in depositing thin films with a XPS F/C ratio as high as 1.7. Under the experimental conditions investigated, contaminant addition slightly affects the F/C ratio of the coatings, and does not cause appreciable O- and N-uptake, but induces a decrease of the deposition rate. Preliminary results from the OES investigation of the gas phase and the GC-MS analysis of the gas effluent are also reported.
| Item Type: | Article |
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| Uncontrolled Keywords: | Atmospheric pressure; dielectric barrier discharge (DBD); fluorocarbon films; plasma-enhanced chemical vapour deposition (PE-CVD) |
| Subjects: | 500 Scienze naturali e Matematica > 500.2 Scienze fisiche 500 Scienze naturali e Matematica > 540 Chimica e scienze connesse |
| Depositing User: | Fiorenza Fanelli |
| Date Deposited: | 26 Jan 2024 14:41 |
| Last Modified: | 26 Jan 2024 14:41 |
| URI: | http://eprints.bice.rm.cnr.it/id/eprint/22645 |
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