Ghezzi, F. and Sancrotti, M. and Dell'Era, F. (2003) Plasma-wall interaction on boronized tiles studied via x-ray photoemission spectroscopy analysis. Technical Report. Consiglio Nazionale delle Ricerche, Roma (IT). Istituto di Fisica del Plasma 'Piero Caldirola' (IFP).
Full text not available from this repository.Abstract
Tiles coming from different positions of the first wall of RFX have been analyzed via X-ray Photoemission Spectroscopy (XPS) at Istituto di fisica del plasma. The objectives are to study the erosion and deposition effects during the discharge and to look at the quality of the boron deposition. There is a good agreement between Rutherford Backscattering and XPS on identifying the metals of the first chamber deposited, as oxides, on the surface of the tiles. The different erosion rates, during the plasma discharges, and the differential sputtering rates during XPS profiling, modified their original concentrations. The high concentration of oxygen pointed out a boronization driven in presence of oxygen gas
| Item Type: | Monograph (Technical Report) |
|---|---|
| Additional Information: | Bibliographical data treatment: CNR. Biblioteca Centrale G. Marconi |
| Subjects: | 500 Scienze naturali e Matematica > 530 Fisica |
| Depositing User: | Luca Tiberi |
| Date Deposited: | 07 Mar 2006 |
| Last Modified: | 20 May 2010 12:00 |
| URI: | http://eprints.bice.rm.cnr.it/id/eprint/52 |
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